Method for producing an optical layer system, and an optical layer system produced therewith

• Main Authors: LIEBSCHNER, ROCCO, BERGK, BEATE, RUDIN, MARK
• Format: Patent
• Language: Chinese; English
• Published: 16.12.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PHYSICS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to a method for producing an optical layer system, and also to said system, which comprises a multiplicity of layers arranged on a substrate, where one part of the layers has a high refractive index nH and another part of the layers has a low refractive index nL and also a further part of the layers has a middle refractive index nM, where nH>nM≥nL and where the layers having different refractive indices have an alternating stacked arrangement. The object of the invention, to specify a method which does not feature long purge times between the layer depositions, where the optical layer system can be realized simply, in short process times, in consistent quality and high quantity, is achieved in that the layers of the optical layer system are deposited onto a substrate by means of a selected coating method from an identical material which is hydrogenated amorphous silicon (a-Si:H) or hydrogenated germanium (Ge:H), where a refractive index and an extinction coefficient of each layer of the