Tool and processes for electrochemical etching

• Main Authors: EKERDT, JOHN G, BARRERA, CRYSTAL, MALLAVARAPU, AKHILA, SREENIVASAN, SIDLGATA V, HRDY, MARK, PANDYA, PARTH, AJAY, PARAS
• Format: Patent
• Language: Chinese; English
• Published: 01.12.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A method for fabricating high aspect ratio nanostructures in arbitrary functional materials. An (N+1)th layer of substrate material is deposited on top of existing N layers of nanostructures, where N is a natural number. The substrate material in the (N+1)th layer is then patterned and etched to cre...