Multi-beam system and multi-beam generating unit with reduced sensitivity to drift and damages

• Main Authors: LENKE, RALF, BIHR, ULRICH, WERTZ, ALEXANDER, RIEDESEL, CHRISTOF, SCHUMACHER, DIETER, KAESTNER, MARCUS, KURIJ, GEORG, SAROV, YANKO, KELP, MICHAEL
• Format: Patent
• Language: Chinese; English
• Published: 01.12.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

Disclosed is a multi-beam generating unit of a multi-beam charged particle imaging system with reduced sensitivity to drift and extended lifetime. Drifts due to x-ray irradiation and thermal loads are minimized by a combination of at least one of a shielding element, a cooling member, or an improved...