Multi-beam system and multi-beam generating unit with reduced sensitivity to drift and damages

Disclosed is a multi-beam generating unit of a multi-beam charged particle imaging system with reduced sensitivity to drift and extended lifetime. Drifts due to x-ray irradiation and thermal loads are minimized by a combination of at least one of a shielding element, a cooling member, or an improved...

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Main Authors LENKE, RALF, BIHR, ULRICH, WERTZ, ALEXANDER, RIEDESEL, CHRISTOF, SCHUMACHER, DIETER, KAESTNER, MARCUS, KURIJ, GEORG, SAROV, YANKO, KELP, MICHAEL
Format Patent
LanguageChinese
English
Published 01.12.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:Disclosed is a multi-beam generating unit of a multi-beam charged particle imaging system with reduced sensitivity to drift and extended lifetime. Drifts due to x-ray irradiation and thermal loads are minimized by a combination of at least one of a shielding element, a cooling member, or an improved architecture and method for operating an active multi-aperture element. A lifetime is further improved by annealing methods of an active multi-aperture element or a microelectronic device forming for example a voltage supply unit.
Bibliography:Application Number: TW20230102217