Semiconductor device and forming method thereof
Nanostructure transistors are formed in a manner that may reduce the likelihood of source/drain region merging in the nanostructure transistors. In a top-down view of a nanostructure transistor described herein, source/drain regions on opposing sides of a nanostructure channel of the nanostructure t...
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Main Authors | , , , , |
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Format | Patent |
Language | Chinese English |
Published |
16.11.2023
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Subjects | |
Online Access | Get full text |
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