Protection tape and grinding method
A protection tape includes a substrate, an adhesive layer and a warpage suppression layer. The warpage suppression layer is located between the substrate and the adhesive layer. The warpage suppression layer has a first coefficient of thermal expansion at a grinding process temperature. The protecti...
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Main Authors | , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
16.09.2023
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Subjects | |
Online Access | Get full text |
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Abstract | A protection tape includes a substrate, an adhesive layer and a warpage suppression layer. The warpage suppression layer is located between the substrate and the adhesive layer. The warpage suppression layer has a first coefficient of thermal expansion at a grinding process temperature. The protection tape after has a second coefficient of thermal expansion at a peeling process temperature after being irradiated to reduce stickiness. The grinding process temperature is lower than the peeling process temperature. The first coefficient of thermal expansion is smaller than the second coefficient of thermal expansion. The second coefficient of thermal expansion is greater than 10 [mu]m/m DEG C. |
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AbstractList | A protection tape includes a substrate, an adhesive layer and a warpage suppression layer. The warpage suppression layer is located between the substrate and the adhesive layer. The warpage suppression layer has a first coefficient of thermal expansion at a grinding process temperature. The protection tape after has a second coefficient of thermal expansion at a peeling process temperature after being irradiated to reduce stickiness. The grinding process temperature is lower than the peeling process temperature. The first coefficient of thermal expansion is smaller than the second coefficient of thermal expansion. The second coefficient of thermal expansion is greater than 10 [mu]m/m DEG C. |
Author | HUANG, CHI-HUA CHEN, CHUN-FA CHEN, XUAN-YOU LIN, CHIN-KAI LEE, CHEN-JU XIE, SHI-ROU |
Author_xml | – fullname: LIN, CHIN-KAI – fullname: HUANG, CHI-HUA – fullname: CHEN, CHUN-FA – fullname: XIE, SHI-ROU – fullname: CHEN, XUAN-YOU – fullname: LEE, CHEN-JU |
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RelatedCompanies | ALLIANCE MATERIAL CO., LTD |
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Snippet | A protection tape includes a substrate, an adhesive layer and a warpage suppression layer. The warpage suppression layer is located between the substrate and... |
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SubjectTerms | ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL PAINTS PERFORMING OPERATIONS POLISHES SEMICONDUCTOR DEVICES TRANSPORTING USE OF MATERIALS AS ADHESIVES |
Title | Protection tape and grinding method |
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