Cleaning liquid and method for cleaning substrate
A cleaning liquid for cleaning a substrate having a first metal atom-containing layer that contains ruthenium and a second metal atom-containing layer that contains a metal atom other than ruthenium, both of the layers contacting each other, and at least one of the first metal atom-containing layer...
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Main Authors | , , , |
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Format | Patent |
Language | Chinese English |
Published |
01.09.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A cleaning liquid for cleaning a substrate having a first metal atom-containing layer that contains ruthenium and a second metal atom-containing layer that contains a metal atom other than ruthenium, both of the layers contacting each other, and at least one of the first metal atom-containing layer and the second metal atom-containing layer is exposed on a surface. The cleaning liquid includes at least one of a compound represented by General Formula (a1), a hydrate of the compound, and a salt of the compound, and at least one amine other than the hydrazine compound and a quaternary hydroxide. In General Formula (a1), R1 and R2 represent an organic group including no carbonyl group or a hydrogen atom. |
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Bibliography: | Application Number: TW202211147360 |