Work stage and exposure apparatus

Disclosed herein is a work stage for holding an organic substrate and an exposure apparatus using the work stage. The work stage comprises: a base having a recess into which vacuum is supplied; a number of substrate holding sections arranged inside the recess and configured to hold an approximately...

Full description

Saved in:
Bibliographic Details
Main Authors SUGISAKI, SHUNTA, NAWAKI, YOHEI
Format Patent
LanguageChinese
English
Published 16.08.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
GENERATION
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:Disclosed herein is a work stage for holding an organic substrate and an exposure apparatus using the work stage. The work stage comprises: a base having a recess into which vacuum is supplied; a number of substrate holding sections arranged inside the recess and configured to hold an approximately entire surface of the organic substrate; and an intake hole configured to supply vacuum into the recess and allow the substrate holding sections to vacuum suction the organic substrate on top surfaces of the substrate holding sections.
Bibliography:Application Number: TW202312103643