Apparatus and method for avoiding a degradation of an optical used surface of a mirror module, projection system, illumination system and projection exposure apparatus

Mirror module (100, 300, 400) for a projection exposure apparatus (200), comprising an optical used surface (104, 303, 403), an optical measurement surface (106, 305, 405, 405'), a measurement apparatus (113, 309, 409, 409') for ascertaining the degradation state of the measurement surface...

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Bibliographic Details
Main Authors SRORM, ARNOLDUS JAN, BECKER, MORITZ, KALLER, JULIAN
Format Patent
LanguageChinese
English
Published 16.08.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Mirror module (100, 300, 400) for a projection exposure apparatus (200), comprising an optical used surface (104, 303, 403), an optical measurement surface (106, 305, 405, 405'), a measurement apparatus (113, 309, 409, 409') for ascertaining the degradation state of the measurement surface, characterized in that the mirror module (100) comprises a temperature control apparatus (108, 109) configured such that the temperature of the optical measurement surface (106, 305, 405, 405') is lower than the temperature of the optical used surface (104, 303, 403).
Bibliography:Application Number: TW202211144514