Stabilization of a manufacturing process of a specimen by shape analysis of structural elements of the specimen

There is provided a system and a method comprising obtaining data Dcontour informative of a contour of an element of a semiconductor specimen acquired by an examination tool, using the data Dcontour to generate a signal informative of a curvature of the contour of the element, determining at least o...

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Bibliographic Details
Main Authors BISTRITZER, RAFAEL, BEN-HARUSH, ILAN, FRISHMAN, EINAT
Format Patent
LanguageChinese
English
Published 01.08.2023
Subjects
MEASURING
MEASURING ELECTRIC VARIABLES
MEASURING MAGNETIC VARIABLES
PHYSICS
TESTING
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Summary:There is provided a system and a method comprising obtaining data Dcontour informative of a contour of an element of a semiconductor specimen acquired by an examination tool, using the data Dcontour to generate a signal informative of a curvature of the contour of the element, determining at least one of data Dperiodicity informative of a periodicity of the signal, or data Ddiscontinuities informative of a number of discontinuities in the signal, wherein each discontinuity is informative of a transition between a convex portion of the contour and a concave portion of the contour, and using at least one of the data Dperiodicity or the data Discontinuities to determine data informative of correct manufacturing of the element.
Bibliography:Application Number: TW202211144764