Exposure method and exposure system

• Main Authors: TAKAMATSU, HIROSUKE, TAKAHASHI, RYOTARO, HIKI, TATSUYA, HASHIMOTO, KIYOAKI, NOGITA, KANTA
• Format: Patent
• Language: Chinese; English
• Published: 16.07.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The present invention addresses the problem of providing an exposure method and an exposure system which make it possible to suppress a decrease in productivity even if the size of an interposer is increased. An exposure method according to an embodiment of the present invention comprises a first ex...