Semiconductor manufacturing apparatus and method of manufacturing semiconductor device
In one embodiment, a semiconductor manufacturing apparatus includes a container configured to contain a substrate, a heater configured to heat the substrate contained in the container, and an injector configured to feed gas to the substrate contained in the container. Furthermore, the injector inclu...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
16.06.2023
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Subjects | |
Online Access | Get full text |
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Summary: | In one embodiment, a semiconductor manufacturing apparatus includes a container configured to contain a substrate, a heater configured to heat the substrate contained in the container, and an injector configured to feed gas to the substrate contained in the container. Furthermore, the injector includes a first layer having a tubular shape, and a second layer provided on a surface of the first layer, and having an emissivity of 0.5 or less. |
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Bibliography: | Application Number: TW202211122856 |