Method for operating a semiconductor process system

A semiconductor process system includes a process chamber. The process chamber includes a wafer support configured to support a wafer. The system includes a bell jar configured to be positioned over the wafer during a semiconductor process. The interior surface of the bell jar is coated with a rough...

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Bibliographic Details
Main Authors WU, CHIHANG, WU, SZU-HUA, LEE, CHIN-SZU, TSAI, TSUNG-YU, HSIEH, MENGUN, HUANG, HSING-YUAN
Format Patent
LanguageChinese
English
Published 01.03.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A semiconductor process system includes a process chamber. The process chamber includes a wafer support configured to support a wafer. The system includes a bell jar configured to be positioned over the wafer during a semiconductor process. The interior surface of the bell jar is coated with a rough coating. The rough coating can include zirconium.
Bibliography:Application Number: TW202110146798