Polybenzoxazole precursor and application thereof

The present invention provides a polybenzoxazole precursor comprising a structure of formula (I):, wherein the definitions of Y, Z, R1, I, j, and V are provided herein. By means of the polybenzoxazole precursor, the resin composition of the present invention is able to forming a film with low dissip...

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Bibliographic Details
Main Authors HSU, STEVE LIENUNG, SHIH, YUIAO, LIN, YUING, CHENG, HOUIEH
Format Patent
LanguageChinese
English
Published 16.01.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:The present invention provides a polybenzoxazole precursor comprising a structure of formula (I):, wherein the definitions of Y, Z, R1, I, j, and V are provided herein. By means of the polybenzoxazole precursor, the resin composition of the present invention is able to forming a film with low dissipation factor and high contrast.
Bibliography:Application Number: TW202110125312