Multi-functional transparent photomask having antistatic and anti-fouling properties and manufacturing method thereof

• Main Authors: PARK, JUNGUL, JIN, BYEONG-KYOU, SONG, HYOUNGAN, IN, JANG-SIK, KWON, AH-HYUN, PARK, CHAE-RI
• Format: Patent
• Language: Chinese; English
• Published: 01.01.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GLASS; HOLOGRAPHY; JOINING GLASS TO GLASS OR OTHER MATERIALS; MATERIALS THEREFOR; METALLURGY; MINERAL OR SLAG WOOL; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS

The present invention relates to a multi-functional transparent photomask configured such that a transparent conductive layer, an adhesion-improving layer, and an antifouling coating layer are sequentially formed on a photomask manufactured by a conventional method to effectively disperse electrostatic charges caused by its repeated detachment from and attachment to a product in a contact or proximity photolithography process, prevent adsorption of a photoresist and floating foreign materials onto the photomask, and improve the lifespan of the functional coating so that various problems occurring in the contact or proximity photolithography process can be solved at one time.