Lower electrode assembly and plasma processing device

• Main Authors: WU, LEI, GUO, ER-FEI, NI, TU-QIANG, YE, RUBIN, WONG, MANUS
• Format: Patent
• Language: Chinese; English
• Published: 16.11.2022
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

According to the lower electrode assembly and the plasma processing device, the protection ring is arranged between the base and the edge ring assembly to cover the welding line and the screw hole in the base, meanwhile, the gap between the edge ring assembly and the base is reduced, and the protection layer is arranged on the outer side of the base, so that the lower electrode assembly and the plasma processing device are protected. The plasma above the substrate and the focusing ring is prevented from leaking into the gap between the base and the edge ring assembly, the plasma is prevented from corroding the base and accessories thereof, and the possibility of arc discharge possibly occurring in the lower electrode assembly is reduced. And moreover, the probability of electric arc generation at the welding wire which is not covered by the protective layer and the screw hole in the base is reduced, so that the use safety of the lower electrode assembly is effectively ensured.