Substrate processing device and substrate processing method

An object of the invention is to provide technology that can obtain an indicator representing the concentration of a drying solution in a mixed fluid. A substrate processing device has a processing vessel, a discharge line, and a density detection section. A supercritical fluid is supplied to the pr...

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Bibliographic Details
Main Authors GOSHO, MASATAKA, YAMANAKA, REIJIRO
Format Patent
LanguageChinese
English
Published 01.11.2022
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:An object of the invention is to provide technology that can obtain an indicator representing the concentration of a drying solution in a mixed fluid. A substrate processing device has a processing vessel, a discharge line, and a density detection section. A supercritical fluid is supplied to the processing vessel, and the substrate is dried by the supercritical fluid replacing the drying solution pooled on the substrate. The discharge line discharges a mixed fluid containing the supercritical fluid and the drying solution from inside the processing vessel. The density detection section detects the density of the mixed fluid flowing through the discharge line.
Bibliography:Application Number: TW202211108303