Lower electrode assembly and plasma processing apparatus including same

The invention relates to a lower electrode assembly and a plasma processing device comprising the lower electrode assembly, and the lower electrode assembly comprises a pedestal; the electrostatic chuck is positioned on the base, is used for adsorbing a substrate to be treated and is made of a ceram...

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Bibliographic Details
Main Authors WU, DEE, JIANG, JIA-WEI, GUO, ER-FEI, WONG, MANUS
Format Patent
LanguageChinese
English
Published 16.10.2022
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The invention relates to a lower electrode assembly and a plasma processing device comprising the lower electrode assembly, and the lower electrode assembly comprises a pedestal; the electrostatic chuck is positioned on the base, is used for adsorbing a substrate to be treated and is made of a ceramic non-metal material; the gas conveying pipeline penetrates through the base and is used for conveying gas; the gas diffusion cavity, the gas inlet and the gas outlet are arranged in the electrostatic chuck, and gas from the gas conveying pipeline enters the gas diffusion cavity through the gas inlet, is diffused by the gas diffusion cavity and then is output to the back surface of a substrate to be processed through the gas outlet. The plasma processing apparatus can prevent arc discharge.
Bibliography:Application Number: TW202110140194