Lithographic apparatus, assembly, and method

• Main Authors: TEN BERGE, GERARDUS FERDINANDUS, HENDRIKS, JIMI
• Format: Patent
• Language: Chinese; English
• Published: 01.09.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

There is described a lithographic apparatus including a membrane assembly and a radiation beam path, wherein the membrane assembly includes a membrane, the membrane being disposed in the radiation beam path, wherein the membrane assembly is configured to selectively move the membrane from a first po...