Storage device, exposure device, and article manufacturing method which accommodates an original plate including the pattern surface on which the pattern is formed and has low humidity for the storage space

• Main Author: FUJINO, KOHEI
• Format: Patent
• Language: Chinese; English
• Published: 01.07.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The present invention provides a storage device which accommodates an original plate including the pattern surface on which the pattern is formed, and includes: a first supply unit which blows and supplies gas to form airflow of at least one of a first airflow and a second airflow, wherein the first...