Storage device, exposure device, and article manufacturing method which accommodates an original plate including the pattern surface on which the pattern is formed and has low humidity for the storage space

• Main Author: FUJINO, KOHEI
• Format: Patent
• Language: Chinese; English
• Published: 01.07.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The present invention provides a storage device which accommodates an original plate including the pattern surface on which the pattern is formed, and includes: a first supply unit which blows and supplies gas to form airflow of at least one of a first airflow and a second airflow, wherein the first airflow is along the first surface of the original plate opposite to the pattern surface and the second airflow is along the second surface opposite to the pattern surface of the protective member, and the protective member is configured as being away from the pattern surface to protect the pattern surface; a second supply unit which blows and supplies gas to form a third airflow that interferes with at least one airflow formed by the first supply unit; and a member including a receiving surface that intersects the blowing direction of the gas blown from the second supply unit and is used to receive the third airflow formed by the second supply unit, wherein the first supply unit is arranged close to the deep side