Semiconductor device manufacturing method, anomaly indication detection method, anomaly indication detection program, and substrate processing device

• Main Authors: KAWAGISHI, TAKAYUKI, KAJI, RYUICHI, SAKAI, MASANORI, YAMAMOTO, KAZUYOSHI, TACHI, YUTA
• Format: Patent
• Language: Chinese; English
• Published: 16.06.2022
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MEASURING; PHYSICS; SEMICONDUCTOR DEVICES; TESTING; TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES; TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR

Provided is a technique in which a process recipe including a plurality of steps is performed to process a substrate, said technique comprising: a vibration data acquisition step for acquiring from a vibration sensor vibration data of a member for exhaust of the environment of a process chamber in which the substrate is processed, during performance of the process recipe; and an anomaly indication detection step for detecting, on the basis of the acquired vibration data, that there is an anomaly indication when the ratio of the intensity of vibration in the rotation frequency of the member to the intensity of vibration in a comparative frequency which is an integral multiple of the rotation frequency exceeds a pre-set anomaly indication threshold.