Optical system, in particular in a microlithographic projection exposure apparatus

The invention relates to an optical system, in particular in a microlithographic projection exposure apparatus, and to a method for heating an optical element in an optical system. According to one aspect, an optical system according to the invention comprises an optical element (450) and at least o...

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Bibliographic Details
Main Authors WOLF, ALEXANDER, GRUNER, TORALF
Format Patent
LanguageChinese
English
Published 16.05.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The invention relates to an optical system, in particular in a microlithographic projection exposure apparatus, and to a method for heating an optical element in an optical system. According to one aspect, an optical system according to the invention comprises an optical element (450) and at least one heating unit (100, 200) for heating said optical element by applying electromagnetic radiation to the optical element, wherein the heating unit comprises as part of an optical collimator (110, 310) and/or as part of a telescope (130, 140, 230, 430), at least one mirror having a non-plane optical effective surface.
Bibliography:Application Number: TW202110132973