Optical system, in particular in a microlithographic projection exposure apparatus
The invention relates to an optical system, in particular in a microlithographic projection exposure apparatus, and to a method for heating an optical element in an optical system. According to one aspect, an optical system according to the invention comprises an optical element (450) and at least o...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
16.05.2022
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to an optical system, in particular in a microlithographic projection exposure apparatus, and to a method for heating an optical element in an optical system. According to one aspect, an optical system according to the invention comprises an optical element (450) and at least one heating unit (100, 200) for heating said optical element by applying electromagnetic radiation to the optical element, wherein the heating unit comprises as part of an optical collimator (110, 310) and/or as part of a telescope (130, 140, 230, 430), at least one mirror having a non-plane optical effective surface. |
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Bibliography: | Application Number: TW202110132973 |