Matched chemistry component body and coating for a semiconductor processing chamber

A component for use in a semiconductor processing chamber is provided. A component body of a dielectric material has a semiconductor processing facing surface. A coating of a dielectric material is on at least the semiconductor processing facing surface, wherein the dielectric material of the compon...

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Bibliographic Details
Main Authors PAPE, ERIC A, DETERT, DOUGLAS
Format Patent
LanguageChinese
English
Published 01.05.2022
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Summary:A component for use in a semiconductor processing chamber is provided. A component body of a dielectric material has a semiconductor processing facing surface. A coating of a dielectric material is on at least the semiconductor processing facing surface, wherein the dielectric material of the component body has a same stoichiometry as the dielectric material of the coating.
Bibliography:Application Number: TW202110123254