Matched chemistry component body and coating for a semiconductor processing chamber
A component for use in a semiconductor processing chamber is provided. A component body of a dielectric material has a semiconductor processing facing surface. A coating of a dielectric material is on at least the semiconductor processing facing surface, wherein the dielectric material of the compon...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
01.05.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A component for use in a semiconductor processing chamber is provided. A component body of a dielectric material has a semiconductor processing facing surface. A coating of a dielectric material is on at least the semiconductor processing facing surface, wherein the dielectric material of the component body has a same stoichiometry as the dielectric material of the coating. |
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Bibliography: | Application Number: TW202110123254 |