Negative photosensitive resin composition, pattern formation method, and laminated film

• Main Authors: NAKAMURA, YUJI, SHIBAGAKI, TOMOYUKI, YAMAGATA, KENICHI, NAKAO, TAKUTO, MASUJIMA, MASAHIRO, IMAI, HIROFUMI, KONDO, TAKAHIRO
• Format: Patent
• Language: Chinese; English
• Published: 16.04.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HETEROCYCLIC COMPOUNDS; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

A negative photosensitive resin composition that contains an epoxy-group-containing resin and a cationic polymerization initiator and includes a sulfonium salt indicated by general formula (10). In the formula (10), R1 and R2 indicate an aryl group, a heterocyclic hydrocarbon group, or an alkyl group. R3-R5 are an alkyl group, a hydroxy group, an alkoxy group, an alkyl carbonyl group, an aryl carbonyl group, an asiloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, a hydroxy (poly) alkyleneoxy group, or a halogen atom. k is an integer 0-4, m is an integer 0-3, and n is an integer 1-4. A is a group indicated by -S-, -O-, -SO-, -SO2-, or -CO-. X- is a monovalent polyatomic atom.