Method for operating vacuum processor
A method for operating a vacuum processing device that sequentially processes a plurality of wafers, said vacuum processing device comprising: a plurality of longitudinally positioned vacuum transport containers that are connected in adjacent pairs, a transfer robot that transports wafers to be proc...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
01.04.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A method for operating a vacuum processing device that sequentially processes a plurality of wafers, said vacuum processing device comprising: a plurality of longitudinally positioned vacuum transport containers that are connected in adjacent pairs, a transfer robot that transports wafers to be processed being positioned in an internal transport chamber; a lock compartment within which the wafer is accommodated, said lock compartment being connected to the vacuum transport container arranged frontmost among the plurality of vacuum transport containers; and a plurality of processing units connected to each of the plurality of vacuum transport containers, processing being performed on the wafer positioned inside the vacuum container, wherein a step for cleaning the interiors of each of the plurality of processing units is implemented after a prescribed period has elapsed. A plurality of sets of processing units that process individual wafers are set in advance from among the plurality of processing units before |
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Bibliography: | Application Number: TW202110131201 |