Plant and process for delivering a gas mixture

The plant for delivering a gas mixture comprising a source of a first gas (1), a source of a second gas (2), a mixer device (3) fluidically connected to the source of first gas (1) and to the source of second gas (2), said mixer device (3) being configured to produce, at an outlet (33), a gas mixtur...

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Bibliographic Details
Main Authors TODOROVA, VANINA, DULPHY, HERVE
Format Patent
LanguageChinese
English
Published 16.02.2022
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Summary:The plant for delivering a gas mixture comprising a source of a first gas (1), a source of a second gas (2), a mixer device (3) fluidically connected to the source of first gas (1) and to the source of second gas (2), said mixer device (3) being configured to produce, at an outlet (33), a gas mixture comprising the first gas and the second gas, a first flow regulator member (41) and a second flow regulator member (42) which are configured to regulate respectively the flow of the first gas and the flow of the second gas flowing towards the mixer device (3) according to a first flow rate setpoint (D1) and a second flow rate setpoint (D2) defining, in operation, a production flow rate (DP) of the gas mixture at the outlet (33) of the mixer device (3), a control unit (5) configured to control the first and second flow regulator members (41, 42) so as to adjust the first flow rate setpoint (D1) and the second flow rate setpoint (D2) in respective proportions relative to the production flow rate (DP), said respecti
Bibliography:Application Number: TW202110120009