Ion beam processing system and methods for manufacturing plasma plate assembly and blocker assembly thereof

An ion beam processing system and methods for manufacturing plasma plate assembly and blocker assembly thereof. The ion beam processing system including a plasma chamber, a plasma plate, disposed alongside the plasma chamber, the plasma plate defining a first extraction aperture, a beam blocker, dis...

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Bibliographic Details
Main Authors DANIELS, KEVIN M, BILOIU, COSTEL, WALLACE, JAY R
Format Patent
LanguageChinese
English
Published 01.02.2022
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Summary:An ion beam processing system and methods for manufacturing plasma plate assembly and blocker assembly thereof. The ion beam processing system including a plasma chamber, a plasma plate, disposed alongside the plasma chamber, the plasma plate defining a first extraction aperture, a beam blocker, disposed within the plasma chamber and facing the extraction aperture, a blocker electrode, disposed on a surface of the beam blocker outside of the plasma chamber, and an extraction electrode disposed on a surface of the plasma plate outside of the plasma chamber.
Bibliography:Application Number: TW202110123247