Member for plasma processing apparatus, method for manufacturing same, and plasma processing apparatus

This member (10, 22) for a plasma processing apparatus is characterized in having a base material (12, 23) and a heat transfer layer (13, 24) provided on one of the surfaces of the base material, the heat transfer layer (13, 24) containing a fluorine-based resin and/or a fluorine-based elastomer.

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Bibliographic Details
Main Authors KATASE, TAKUMA, ISHIKAWA, FUMIAKI, YASOSHIMA, TSUKASA, SHIONO, ICHIRO, KURATA, YUTO
Format Patent
LanguageChinese
English
Published 16.12.2021
Subjects
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Summary:This member (10, 22) for a plasma processing apparatus is characterized in having a base material (12, 23) and a heat transfer layer (13, 24) provided on one of the surfaces of the base material, the heat transfer layer (13, 24) containing a fluorine-based resin and/or a fluorine-based elastomer.
Bibliography:Application Number: TW202110107847