Platen, assembly for holding workpiece, and electrostatic chuck

A platen having improved thermal conductivity and reduced friction, an assembly for holding a workpiece, and an electrostatic chuck are disclosed. In one embodiment, vertically aligned carbon nanotubes are grown on the top surface of the platen. The carbon nanotubes have excellent thermal conductivi...

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Bibliographic Details
Main Authors SUN, DA-WEI, CHIPMAN, DAVID J, ANELLA, STEVEN M, RON, SERISKY, BLAKE, JULIAN G, CHEN, QIN
Format Patent
LanguageChinese
English
Published 16.11.2021
Subjects
BASIC ELECTRIC ELEMENTS
CHEMISTRY
COMPOUNDS THEREOF
CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GENERATION
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
SEMICONDUCTOR DEVICES
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Summary:A platen having improved thermal conductivity and reduced friction, an assembly for holding a workpiece, and an electrostatic chuck are disclosed. In one embodiment, vertically aligned carbon nanotubes are grown on the top surface of the platen. The carbon nanotubes have excellent thermal conductivity, thus improving the transfer of heat between the platen and the workpiece. Furthermore, the friction between the carbon nanotubes and the workpiece is much lower than that with conventional embossments, reducing particle generation. In another embodiment, a support plate is disposed on the platen, wherein the carbon nanotubes are disposed on the top surface of the support plate.
Bibliography:Application Number: TW202110100193