Stain-resistant branched polyamides
The present disclosure provides a polyamide composition and method of making a polyamide composition. The polyamide composition includes branched chains to provide for greater fiber tenacity and residues of a salt of 5-sulfoisophthalic or 5-sulfoisophthalic acid to provide excellent stain resistance...
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Main Authors | , , , , |
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Format | Patent |
Language | Chinese English |
Published |
01.10.2021
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Subjects | |
Online Access | Get full text |
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Summary: | The present disclosure provides a polyamide composition and method of making a polyamide composition. The polyamide composition includes branched chains to provide for greater fiber tenacity and residues of a salt of 5-sulfoisophthalic or 5-sulfoisophthalic acid to provide excellent stain resistance. |
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Bibliography: | Application Number: TW202110105654 |