Stain-resistant branched polyamides

The present disclosure provides a polyamide composition and method of making a polyamide composition. The polyamide composition includes branched chains to provide for greater fiber tenacity and residues of a salt of 5-sulfoisophthalic or 5-sulfoisophthalic acid to provide excellent stain resistance...

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Main Authors LOY, DAVID, NELLIAPPAN, VEERA, STRZELECKI, MARY, TALEBI, FARZANEH, WESTON, JOSEPH
Format Patent
LanguageChinese
English
Published 01.10.2021
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Summary:The present disclosure provides a polyamide composition and method of making a polyamide composition. The polyamide composition includes branched chains to provide for greater fiber tenacity and residues of a salt of 5-sulfoisophthalic or 5-sulfoisophthalic acid to provide excellent stain resistance.
Bibliography:Application Number: TW202110105654