Projection exposure apparatus for semiconductor lithography

The invention relates to a projection exposure apparatus (1) for semiconductor lithography, comprising a mirror (50), wherein the mirror (50) comprises at least one cutout (53), a temperature-regulating device (30,40) for regulating temperature on the basis of radiation comprising a temperature-regu...

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Bibliographic Details
Main Authors WOLF, ALEXANDER, GRUNER, TORALF, HARTJES, JOACHIM
Format Patent
LanguageChinese
English
Published 01.08.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The invention relates to a projection exposure apparatus (1) for semiconductor lithography, comprising a mirror (50), wherein the mirror (50) comprises at least one cutout (53), a temperature-regulating device (30,40) for regulating temperature on the basis of radiation comprising a temperature-regulating body (31,41), which is arranged without contact in the cutout (53) of the mirror (50) and which has a cavity (33,43). According to the invention, a fluid (39) for temperature regulation of the temperature-regulating body (31) is present in the cavity (33,43).
Bibliography:Application Number: TW20209142987