Projection exposure apparatus for semiconductor lithography
The invention relates to a projection exposure apparatus (1) for semiconductor lithography, comprising a mirror (50), wherein the mirror (50) comprises at least one cutout (53), a temperature-regulating device (30,40) for regulating temperature on the basis of radiation comprising a temperature-regu...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
01.08.2021
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a projection exposure apparatus (1) for semiconductor lithography, comprising a mirror (50), wherein the mirror (50) comprises at least one cutout (53), a temperature-regulating device (30,40) for regulating temperature on the basis of radiation comprising a temperature-regulating body (31,41), which is arranged without contact in the cutout (53) of the mirror (50) and which has a cavity (33,43). According to the invention, a fluid (39) for temperature regulation of the temperature-regulating body (31) is present in the cavity (33,43). |
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Bibliography: | Application Number: TW20209142987 |