Evacuation method capable of preventing dust explosion in phosphorus-doped single-crystal silicon production and phosphorus-doped single-crystal silicon production method using same
An evacuation method capable of preventing dust explosion in phosphorus-doped single-crystal silicon production, a single-crystal furnace for producing phosphorus-doped single-crystal silicon comprising a main chamber and an auxiliary chamber which are in communication with each other, the auxiliary...
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Main Author | |
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Format | Patent |
Language | Chinese English |
Published |
16.07.2021
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Subjects | |
Online Access | Get full text |
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Summary: | An evacuation method capable of preventing dust explosion in phosphorus-doped single-crystal silicon production, a single-crystal furnace for producing phosphorus-doped single-crystal silicon comprising a main chamber and an auxiliary chamber which are in communication with each other, the auxiliary chamber being provided above the main chamber; the evacuation method comprises the following steps: S1, sequentially connecting a main valve and a main pump to the main chamber by using a first pipeline, and closing the main valve and the main pump; S2, sequentially connecting an auxiliary valve and an auxiliary pump to the auxiliary chamber by using a second pipeline, and connecting a quick charging valve to the main chamber or the auxiliary chamber by using a third pipeline; opening the auxiliary valve and the auxiliary pump to extract air from the single-crystal furnace, and controlling the quick charging valve to introduce inert gas into the single-crystal furnace. The described evacuation method can gradually |
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Bibliography: | Application Number: TW20209142263 |