Semiconductor structure and method for forming the same

• Main Author: CHUANG, CHE-FU
• Format: Patent
• Language: Chinese; English
• Published: 01.06.2021
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A method for forming a semiconductor structure including the following steps: providing a substrate; forming a plurality of gate structures on the substrate; forming a lining layer on the substrate and the gate structure; forming a first spacer layer on the lining layer; forming a stopping layer on...