Semiconductor structure and method for forming the same
A method for forming a semiconductor structure including the following steps: providing a substrate; forming a plurality of gate structures on the substrate; forming a lining layer on the substrate and the gate structure; forming a first spacer layer on the lining layer; forming a stopping layer on...
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Main Author | |
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Format | Patent |
Language | Chinese English |
Published |
01.06.2021
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Subjects | |
Online Access | Get full text |
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