Semiconductor device
A semiconductor device is disclosed. The semiconductor device includes a substrate, a metal-oxide-semiconductor device, and a feature. The metal-oxide-semiconductor device is disposed in the substrate. The feature is disposed adjacent to the metal-oxide-semiconductor device. The feature extends into...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
01.05.2021
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Subjects | |
Online Access | Get full text |
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Summary: | A semiconductor device is disclosed. The semiconductor device includes a substrate, a metal-oxide-semiconductor device, and a feature. The metal-oxide-semiconductor device is disposed in the substrate. The feature is disposed adjacent to the metal-oxide-semiconductor device. The feature extends into the substrate with a first depth and the metal-oxide-semiconductor device extends into the substrate with a second depth smaller than the first depth. |
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Bibliography: | Application Number: TW20200116770 |