Substrate shape measuring device, substrate handling device, substrate shape measuring unit and method to handle substrates

• Main Authors: VAN DORST, RINGO PETRUS CORNELIS, KRAMER, GIJS
• Format: Patent
• Language: Chinese; English
• Published: 01.05.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

The invention provides a substrate shape measuring device, comprising: a substrate support to support a substrate having a main surface, said main surface of the substrate when supported by the substrate support substantially extending in a first plane, one or more sensor assemblies, each comprising a light emitter to emit light along a light axis substantially parallel to the first plane and a light sensor arranged to receive the light, wherein the substrate shape measuring device is constructed to measure with the one or more sensor assemblies in at least a first measurement direction with respect to the substrate substantially parallel to the first plane and a second measurement direction with respect to the substrate substantially parallel to the first plane, wherein the substrate shape measuring device comprises a processing device arranged to determine a shape of the substrate.