Substrate shape measuring device, substrate handling device, substrate shape measuring unit and method to handle substrates
The invention provides a substrate shape measuring device, comprising: a substrate support to support a substrate having a main surface, said main surface of the substrate when supported by the substrate support substantially extending in a first plane, one or more sensor assemblies, each comprising...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
01.05.2021
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Subjects | |
Online Access | Get full text |
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Summary: | The invention provides a substrate shape measuring device, comprising: a substrate support to support a substrate having a main surface, said main surface of the substrate when supported by the substrate support substantially extending in a first plane, one or more sensor assemblies, each comprising a light emitter to emit light along a light axis substantially parallel to the first plane and a light sensor arranged to receive the light, wherein the substrate shape measuring device is constructed to measure with the one or more sensor assemblies in at least a first measurement direction with respect to the substrate substantially parallel to the first plane and a second measurement direction with respect to the substrate substantially parallel to the first plane, wherein the substrate shape measuring device comprises a processing device arranged to determine a shape of the substrate. |
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Bibliography: | Application Number: TW20209122721 |