Drawing method and drawing apparatus which will realize the miniaturization of the pattern shape without reducing the depth of focus

• Main Authors: NORIMITSU, YOSHINAO, MATSUI, HIROSHI
• Format: Patent
• Language: Chinese; English
• Published: 16.03.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A subject of the present invention is to realize the miniaturization of a formed pattern shape while suppressing a reduction of a depth of focus and the like. A drawing method of the invention includes the following steps: a step of irradiating drawing light using a second drawing pattern at least a part of which contains a first displacement pattern on a photosensitive material; a step of developing the photosensitive material; and a step of forming a first pattern shape on an upper surface of the substrate. The first displacement pattern is a unit pattern that overlaps at least a part of the corresponding unit pattern in a first drawing pattern and is offset from the corresponding unit pattern.