A substrate holder for use in a lithographic apparatus
The invention relates to a substrate holder comprising a main body formed of a conductive material from which a plurality of burls are projecting; an insulation layer disposed on at least the distal ends of a group of these burls; and a hard layer resistant to wear disposed on the insulation layer....
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
01.02.2021
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a substrate holder comprising a main body formed of a conductive material from which a plurality of burls are projecting; an insulation layer disposed on at least the distal ends of a group of these burls; and a hard layer resistant to wear disposed on the insulation layer. The invention further relates to a substrate holder comprising a main body formed of an insulating material from which a plurality of burls are projecting; a hard layer resistant to wear disposed on and localised to the distal ends of a group of these burls. The invention further relates to a lithographic apparatus comprising any of these substrate holders. |
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Bibliography: | Application Number: TW20209113422 |