Lithography apparatus comprising a plurality of individually controllable write heads

The invention relates to a lithography apparatus (100) for writing to substrate wafers (300) comprising: - a light generating device (110) comprising one or a plurality of light sources (111, 112, 113) for generating light, - a light transferring device (120) comprising a number of optical waveguide...

Full description

Saved in:
Bibliographic Details
Main Authors RICHTER, STEFAN, RUDOLPH, GUENTER, VOELCKER, MARTIN, DOERING, DIRK, DEGUENTHER, MARKUS, SENTHIL KUMAR, LAKSHMANAN, GEISSLER, ENRICO
Format Patent
LanguageChinese
English
Published 01.02.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:The invention relates to a lithography apparatus (100) for writing to substrate wafers (300) comprising: - a light generating device (110) comprising one or a plurality of light sources (111, 112, 113) for generating light, - a light transferring device (120) comprising a number of optical waveguides (1211-121N) for transferring the light from the light generating device (110) to a writing device (140), - the writing device (140) comprising a plurality of individually controllable write heads (200i,j) for projecting the light from the one or the plurality of light sources (111, 112, 113) in different regions of a substrate wafer (300), - a transport device (150) for moving the substrate wafer (300) relative to the writing device (140) in a predefined transport direction (x), and - a control device (170) for controlling the writing process on the substrate wafer (300).
Bibliography:Application Number: TW20209131151