Photomask assembly with reflective photomask and method of manufacturing a reflective photomask

A photomask assembly (900) includes a reflective photomask (100) and a protection structure (200). The reflective photomask (100) includes a substrate (110) and a reflective multilayer (120) on a first substrate surface (111) of the substrate (110) at a front side of the reflective photomask (100)....

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Bibliographic Details
Main Authors SCHEDEL, THORSTEN, SCHENKE, ANDREAS, BENDER, MARKUS
Format Patent
LanguageChinese
English
Published 16.11.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A photomask assembly (900) includes a reflective photomask (100) and a protection structure (200). The reflective photomask (100) includes a substrate (110) and a reflective multilayer (120) on a first substrate surface (111) of the substrate (110) at a front side of the reflective photomask (100). The protection structure (200) on a second substrate surface (112) of the substrate (110) at a backside of the reflective photomask (100) is detachable from the reflective photomask (100) at a temperature below 150 degree Celsius.
Bibliography:Application Number: TW20209100588