Method for producing a substrate for an optical element, and reflective optical element

• Main Authors: SCHMEHL, ANDREAS, SIEKMANN, HEIKO
• Format: Patent
• Language: Chinese; English
• Published: 16.01.2020
• Subjects: AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS SPECIALLY ADAPTED THEREFOR; APPARATUS THEREFOR; CHEMISTRY; CINEMATOGRAPHY; CRYSTAL GROWTH; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; REFINING BY ZONE-MELTING OF MATERIAL; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; SINGLE-CRYSTAL-GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL

The invention relates to a method for producing a substrate (10) for an optical element (11), comprising: introducing a starting material, preferably a metal or a semimetal, into a container and melting the starting material, producing a material body having a quasi-monocrystalline volume region (8) by directionally solidifying the molten starting material proceeding from one or from a plurality of monocrystalline seed plates arranged in the region of a base of the container, and producing the substrate (10) by processing the material body to form an optical surface (12). The invention also relates to a reflective optical element (11), in particular for reflecting EUV radiation (14), comprising: a substrate (10) having an optical surface (12), on which a reflective coating (13) is applied. The substrate (10) is typically produced in accordance with the method described above and has a quasi-monocrystalline volume region (8).