Method for controlling a manufacturing apparatus and associated apparatuses

Disclosed is s method for determining a plurality of corrections for control of at least one manufacturing apparatus used in a manufacturing process for providing product structures to a substrate in a plurality of layers, the method comprising: determining the plurality of corrections comprising a...

Full description

Saved in:
Bibliographic Details
Main Authors WERKMAN, ROY, VERGAIJ-HUIZER, LYDIA MARIANNA, RAJASEKHARAN, BIJOY, VAN ITTERSUM, RONALD, WILDENBERG, JO SEBASTIAAN, SMORENBERG, PIETER GERARDUS JACOBUS, YAGUBIZADE, HADI, WEI, XIUHONG, VAN DER HEIJDEN, ROBERTUS WILHELMUS
Format Patent
LanguageChinese
English
Published 01.09.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:Disclosed is s method for determining a plurality of corrections for control of at least one manufacturing apparatus used in a manufacturing process for providing product structures to a substrate in a plurality of layers, the method comprising: determining the plurality of corrections comprising a correction for each layer, based on an actuation potential of the applicable manufacturing apparatus used in the formation of each layer, wherein said determining step comprises determining corrections for each layer simultaneously in terms of a matching parameter.
Bibliography:Application Number: TW20187143184