Coaxial-interconnect structure for a semiconductor component
The present disclosure describes a coaxial-interconnect structure that is integrated into a semiconductor component and methods of forming the coaxial-interconnect structure. The coaxial interconnect-structure, which electrically couples circuitry of an integrated-circuit (IC) die to traces of a pac...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
16.08.2019
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Subjects | |
Online Access | Get full text |
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Summary: | The present disclosure describes a coaxial-interconnect structure that is integrated into a semiconductor component and methods of forming the coaxial-interconnect structure. The coaxial interconnect-structure, which electrically couples circuitry of an integrated-circuit (IC) die to traces of a packaging substrate, comprises a signal core elongated about an axis, a ground shield elongated about the axis, and an insulator disposed between the signal core and the ground shield. |
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Bibliography: | Application Number: TW20187134736 |