P-type field effect transistor and method for fabricating the same
A method for fabricating p-type field effect transistor (FET) includes the steps of first providing a substrate, forming a pad layer on the substrate, forming a well in the substrate, performing an ion implantation process to implant germanium ions into the substrate to form a channel region, and th...
Saved in:
Main Authors | , , , , , , , , , |
---|---|
Format | Patent |
Language | Chinese English |
Published |
01.08.2019
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | A method for fabricating p-type field effect transistor (FET) includes the steps of first providing a substrate, forming a pad layer on the substrate, forming a well in the substrate, performing an ion implantation process to implant germanium ions into the substrate to form a channel region, and then conducting an anneal process to divide the channel region into a top portion and a bottom portion. After removing the pad layer, a gate structure is formed on the substrate and a lightly doped drain (LDD) is formed adjacent to two sides of the gate structure. |
---|---|
AbstractList | A method for fabricating p-type field effect transistor (FET) includes the steps of first providing a substrate, forming a pad layer on the substrate, forming a well in the substrate, performing an ion implantation process to implant germanium ions into the substrate to form a channel region, and then conducting an anneal process to divide the channel region into a top portion and a bottom portion. After removing the pad layer, a gate structure is formed on the substrate and a lightly doped drain (LDD) is formed adjacent to two sides of the gate structure. |
Author | LIU, SHI-YOU WU, CHIHIANG CHEN, TI-BIN HSIAO, YA-YIN CHEN, SHAO-PING YU, CHIEN-WEN MA, HUANI LIU, YUUN WEN, TSAI-YU LI, CHING-I |
Author_xml | – fullname: WEN, TSAI-YU – fullname: HSIAO, YA-YIN – fullname: CHEN, TI-BIN – fullname: YU, CHIEN-WEN – fullname: MA, HUANI – fullname: WU, CHIHIANG – fullname: LIU, YUUN – fullname: LI, CHING-I – fullname: LIU, SHI-YOU – fullname: CHEN, SHAO-PING |
BookMark | eNrjYmDJy89L5WRwCtAtqSxIVUjLTM1JUUhNS0tNLlEoKUrMK84sLskvUkjMS1HITS3JyE9RSANy0xKTijKTE0sy89IVSjJSFYoTc1N5GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakl8SLiRgaGlsaGJibGjMTFqACwxM5Y |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences |
ExternalDocumentID | TW201931443A |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_TW201931443A3 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 14:34:40 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | Chinese English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_TW201931443A3 |
Notes | Application Number: TW20187101053 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190801&DB=EPODOC&CC=TW&NR=201931443A |
ParticipantIDs | epo_espacenet_TW201931443A |
PublicationCentury | 2000 |
PublicationDate | 20190801 |
PublicationDateYYYYMMDD | 2019-08-01 |
PublicationDate_xml | – month: 08 year: 2019 text: 20190801 day: 01 |
PublicationDecade | 2010 |
PublicationYear | 2019 |
RelatedCompanies | UNITED MICROELECTRONICS CORP |
RelatedCompanies_xml | – name: UNITED MICROELECTRONICS CORP |
Score | 3.3422482 |
Snippet | A method for fabricating p-type field effect transistor (FET) includes the steps of first providing a substrate, forming a pad layer on the substrate, forming... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
Title | P-type field effect transistor and method for fabricating the same |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190801&DB=EPODOC&locale=&CC=TW&NR=201931443A |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1bS8MwFD7MKeqbTsXNCxGkb8HVXkYfitgbQ9hWpLq9jWZpp8KyYSuCv96TtHO-6FsuEJKQk-9L8uUcgGsr03mKyEy73GbU7Bk2dTjndKbjEuJd20mVNmcwtPtP5sPEmjTgbf0XRvkJ_VTOEdGiZmjvpdqvV5tLrEBpK4sb9opFy7socQOtPh0juuGOqwWeG8ajYORrvu8mY234qOoMPDwY91uwLWm09LMfPnvyV8rqN6REB7ATY2uiPITG10sL9vx15LUW7A7qB29M1rZXHIEXU3lfSpTmjFQ6DFJKqFGePkgqOKniQRMkoiRPWRUBSMwJkjxSpIvsGK6iMPH7FDsz_Rn5NBlv-m2cQFMsRXYKxGRmnhvIXHQkb9zhLGcmzrh8jnVue1bWhs7f7XT-qzyDfZmpFG7n0CzfP7ILRN2SXarp-gaRUoZ9 |
link.rule.ids | 230,309,786,891,25594,76906 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1bS8MwFD7MKc43nYrOWwTpW3Bdb_ShiG03pq7bkOr2Vpql9QJ2w1YEf70naed80beQAyEJOfm-JF_OAbgwEpXHiMy0zU1GdUszqc05pzMVlxBvm3YstTnB0Ow_6LdTY1qD1-VfGBkn9FMGR0SPmqG_F3K_XqwusXyprcwv2QtWza96oeMr1ekY0Q13XMV3ne545I88xfOccKIM76VNw8ODdr0G65aIziuo06MrfqUsfkNKbxs2xthaVuxA7eu5CQ1vmXmtCZtB9eCNxcr38l1wx1TclxKpOSOlDoMUAmpkpA8SZ5yU-aAJElGSxqzMAJQ9ESR5JI_fkj0473VDr0-xM9HPyKNwsuq3tg_1bJ4lB0B0pqephsxFRfLGbc5SpuOMi-dYu2MZySG0_m6n9Z_xDBr9MBhEg5vh3RFsCUOpdjuGevH-kZwgAhfsVE7dNwP9iWo |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=P-type+field+effect+transistor+and+method+for+fabricating+the+same&rft.inventor=WEN%2C+TSAI-YU&rft.inventor=HSIAO%2C+YA-YIN&rft.inventor=CHEN%2C+TI-BIN&rft.inventor=YU%2C+CHIEN-WEN&rft.inventor=MA%2C+HUANI&rft.inventor=WU%2C+CHIHIANG&rft.inventor=LIU%2C+YUUN&rft.inventor=LI%2C+CHING-I&rft.inventor=LIU%2C+SHI-YOU&rft.inventor=CHEN%2C+SHAO-PING&rft.date=2019-08-01&rft.externalDBID=A&rft.externalDocID=TW201931443A |