Reticle, reticle container and method for discharging static charges on reticle

• Main Authors: KUO, CHUEHI, CHENG, POUNG, HSU, CHEANG, CHANG, HSIAO-LUN, LEE, TSUNG-YEN, FU, TZUNGI, CHEN, LI-JUI
• Format: Patent
• Language: Chinese; English
• Published: 01.07.2019
• Subjects: ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS,e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES,DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; CONVEYING; ELECTROGRAPHY; HANDLING THIN OR FILAMENTARY MATERIAL; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PACKAGES; PACKAGING ELEMENTS; PACKING; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; STORING; TRANSPORTING

A reticle, a reticle container and a method for discharging static charges accumulated on a reticle are provided. The reticle includes a mask substrate, a reflective multilayer (ML) structure, a capping layer, an absorption structure and a conductive material structure. The mask substrate has a front-side surface and a back-side surface. The reflective ML structure is positioned over the front-side surface of mask substrate. The capping layer is positioned over the reflective ML structure. The absorption structure is positioned over the capping layer. The conductive material structure is positioned over a sidewall surface of the mask substrate and a sidewall surface of the absorption structure.