Methods for generating a mask pattern

Embodiments of the present disclosure provide a method of generating mandrel patterns. A mandrel pattern is generated by constructing a boundary box, initiating a plurality of lead mandrels, and extending the lead mandrels across the boundary box. When a pattern region includes holes, portions of ma...

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Bibliographic Details
Main Authors CHIANG, CHIA-PING, GAU, TSAI-SHENG, CHIH, MING-HUI, WANG, TSUNG-YU, CHENG, NIAN-FUH, HUANG, WENUN
Format Patent
LanguageChinese
English
Published 01.04.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Embodiments of the present disclosure provide a method of generating mandrel patterns. A mandrel pattern is generated by constructing a boundary box, initiating a plurality of lead mandrels, and extending the lead mandrels across the boundary box. When a pattern region includes holes, portions of mandrels are removed from the holes after extension of the leading mandrels.
Bibliography:Application Number: TW20176140926