Hybrid MOCVD/MBE epitaxial growth of high-efficiency lattice-matched multijunction solar cells
Semiconductor devices and methods of fabricating semiconductor devices having a dilute nitride layer and at least one semiconductor material overlying the dilute nitride layer are disclosed. Hybrid epitaxial growth and the use of aluminum barrier layers to minimize hydrogen diffusion into the dilute...
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Main Authors | , , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
16.02.2019
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Subjects | |
Online Access | Get full text |
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Summary: | Semiconductor devices and methods of fabricating semiconductor devices having a dilute nitride layer and at least one semiconductor material overlying the dilute nitride layer are disclosed. Hybrid epitaxial growth and the use of aluminum barrier layers to minimize hydrogen diffusion into the dilute nitride layer are used to fabricate high-efficiency multijunction solar cells. |
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Bibliography: | Application Number: TW20187123242 |