Etching waste fluid treatment system and etching waste fluid treatment method

• Main Authors: FUJIHARA, TAKESHI, KAI, KOUJI, NAKASEKO, TAKAO, NAKAJIMA, TAKAHITO, SAKURAI, KENICHI, YAMASAKI, YUU, ISHIKAWA, NAOKI
• Format: Patent
• Language: Chinese; English
• Published: 16.11.2018
• Subjects: ADHESIVES; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; COMPOUNDS THEREOF; DYES; GLASS; INORGANIC CHEMISTRY; JOINING GLASS TO GLASS OR OTHER MATERIALS; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MINERAL OR SLAG WOOL; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; NON-METALLIC ELEMENTS; PAINTS; POLISHES; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS; TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE

To provide a waste treatment system and a waste treatment method capable of carrying out etching waste fluid treatment easily while holding down costs regardless of the state of etching waste fluid generated by etching processing of a glass substrate. An etching waste fluid treatment system 10 is constituted so as to treat etching waste fluid generated by an etching device for performing etching processing on a glass substrate. This etching waste fluid treatment system 10 is at least provided with a reaction tank 15 and an acidic scrubber 30 as a detoxification means. In the reaction tank 15, the etching waste fluid acidity is mitigated while increasing the viscosity to the extent possible for fluid flow, and further, the increased viscosity etching waste fluid is formed into a neutral sludge.