Switching device with charge distribution structure
A semiconductor device includes a substrate and a first active layer disposed over the substrate. The semiconductor device also includes a second active layer disposed on the first active layer such that a lateral conductive channel arises between the first active layer and the second active layer....
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
01.10.2018
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Subjects | |
Online Access | Get full text |
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Summary: | A semiconductor device includes a substrate and a first active layer disposed over the substrate. The semiconductor device also includes a second active layer disposed on the first active layer such that a lateral conductive channel arises between the first active layer and the second active layer. A source, gate and drain contact are disposed over the second active layer. A conductive charge distribution structure is disposed over the second active layer between the gate and drain contacts. The conductive charge distribution structure is capacitively coupled to the gate contact. |
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Bibliography: | Application Number: TW20187107056 |